| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus with which the effects on the shape of a sample-carrying port on plasma can be reduced through a simple arrangement. <P>SOLUTION: The plasma processing apparatus comprises a vacuum processing chamber 6 having a port 14 for carrying in or carrying out a substrate being processed; a means 7 for supplying processing gas into the vacuum processing chamber 6; means 4, 8 for generating plasma by supplying high frequency energy to processing gas supplied into the vacuum processing chamber, a lower electrode 10 held movably in the vertical directions in the vacuum processing chamber and holding the substrate being processed, while mounting in the vacuum processing chamber; a tubular carrying port shut-off wall 16 covering the inner circumference of the vacuum processing chamber slidably including the opening of the carrying port; and a portion 17 for coupling the lower electrode and the carrying port shut off wall, wherein the opening of the carrying port 14 is shut off by the carrying port shut off wall 16, when the lower electrode 10 ascends to the operating position of the processing device. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
