| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a patterning method in which a problem regarding productivity, quality, and increase of manufacturing cost can be solved by the patterning method of ITO film for patterning the ITO film to a prescribed shape because on one face of a substrate, in the order from the substrate side, a colored layer, an overcoat layer (flat layer), an ITO film are laminated, and against a color filter substrate for a liquid crystal display device in which the ITO film is made to be a surface layer, the prescribed laser beam is selectively irradiated to that ITO film at the prescribed shape. <P>SOLUTION: In this patterning method, as the prescribed laser beam, excimer laser beam is used in which ablation that is a non-thermal photodecomposition reaction is made to occur against the ITO film of the substrate for working to be worked and which is low exothermic ultraviolet wavelength against the ITO film and an organic layer under the ITO film, and under irradiation condition of the laser beam in which quality damage such as injury is not caused for one other than the ITO film, the laser beam is selectively irradiated against the ITO film of the substrate for working, the ITO film is removed in the irradiation region, and a punched pattern is formed in the ITO film. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
