发明名称 |
NROM DEVICE AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To form a nonvolatile read only device with a self alignment method. SOLUTION: A method of forming a memory device (and a device obtained as a result) comprises the steps of: forming an electron trap dielectric material on a substrate; forming a conductive material on the dielectric material; forming a material spacer on the conductive material; forming a segment thereof positioned under the material spacer by removing a part of each of the dielectric material and the conductive material; forming inside the substrate first and second spaced regions having a secondary conductivity type different from that of the substrate; extending a channel region between the first and second regions; controlling a conductivity thereof by positioning the segments of the dielectric material and a first conductive material on the first part of the channel region; forming a second conductive material on the second part of the channel region; and controlling a conductivity thereof so as to be isolated from this second conductive material. COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006114921(A) |
申请公布日期 |
2006.04.27 |
申请号 |
JP20050322821 |
申请日期 |
2005.10.07 |
申请人 |
SILICON STORAGE TECHNOLOGY INC |
发明人 |
CHEN BOMY;LEE DANA;HU YAW WEN;YEH BING |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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