发明名称 NROM DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To form a nonvolatile read only device with a self alignment method. SOLUTION: A method of forming a memory device (and a device obtained as a result) comprises the steps of: forming an electron trap dielectric material on a substrate; forming a conductive material on the dielectric material; forming a material spacer on the conductive material; forming a segment thereof positioned under the material spacer by removing a part of each of the dielectric material and the conductive material; forming inside the substrate first and second spaced regions having a secondary conductivity type different from that of the substrate; extending a channel region between the first and second regions; controlling a conductivity thereof by positioning the segments of the dielectric material and a first conductive material on the first part of the channel region; forming a second conductive material on the second part of the channel region; and controlling a conductivity thereof so as to be isolated from this second conductive material. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006114921(A) 申请公布日期 2006.04.27
申请号 JP20050322821 申请日期 2005.10.07
申请人 SILICON STORAGE TECHNOLOGY INC 发明人 CHEN BOMY;LEE DANA;HU YAW WEN;YEH BING
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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