发明名称 |
Apparatus for and method of processing substrate |
摘要 |
A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle of developer allowed to remain on the substrate. This causes a development reaction to proceed. Subsequently, deionized water is supplied from a deionized water discharge nozzle to the substrate to stop the development reaction, and the substrate is rotated while part of the puddle of developer is allowed to remain on the surface of the substrate. This makes a dissolution product easy to diffuse in the developer remaining on the surface of the substrate to promote the dissolution of the resist. A rinsing process and a drying process are performed to complete the development process.
|
申请公布号 |
US2006088791(A1) |
申请公布日期 |
2006.04.27 |
申请号 |
US20050245347 |
申请日期 |
2005.10.06 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
HARUMOTO MASAHIKO;SANADA MASAKAZU |
分类号 |
H01L21/027;B05C11/08;B05D1/40 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|