| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a charged-particle-beam exposure apparatus whereby such the aberration of the beam of the exposure apparatus as a curvature of field can be reduced without deteriorating the telecentric characteristics possessed by it on both its input and output sides relative to the exposure apparatus. <P>SOLUTION: In the charged-particle-beam exposure apparatus, a main beam 3 obliquely incident on a reticle 1 is so deflected by the action of a fifth deflector 15 as to be made vertically incident on the surface of the reticle 1. Also, the main beam 3 is so emitted vertically from the surface of the reticle 1, and is so deflected by the mutual action generated between a first deflector 10 and the fifth deflector 15 as to be directed to the side of the optical axis of the exposure apparatus in the closer position to the reticle 1 than the position of the first deflector 10, and as to progress more closely to the optical axis than the position shown in Figure 2. Then, although the main beam 3 proceeds obliquely up to the vicinity of a wafer 8, it is so deflected by the mutual action generated between a fourth deflector 13 and a sixth deflector 16 in the closer position to the wafer 8 than the position of the fourth deflector 13 as to become vertical to the wafer 8 and as to be made vertically incident on the wafer 8. As a result, such an aberration of a beam of the exposure apparatus as a curvature of field can be reduced without deteriorating the telecentric characteristics possessed by it on both its input and output sides relative to the exposure apparatus. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
