发明名称 Method and apparatus for contact hole unit cell formation
摘要 A method for forming a contact hole unit cell is provided. A light transparent contact hole region of a first phase is positioned at a first plane. A light transparent phase-shifting region of a second phase is positioned at the first plane, the second phase being substantially out of phase with the first phase. The phase-shifting region substantially surrounds the contact hole region. A light transparent border region is positioned at the first plane outside and substantially surrounding the phase-shifting region. The border region has a phase substantially the same as that of the contact hole region. The contact hole region, the phase-shifting region, and the border region are positioned to cause light from the first plane to be reinforcing in a target contact hole configuration on a second plane and to be substantially neutralizing outside the target contact hole configuration on the second plane.
申请公布号 US2006088770(A1) 申请公布日期 2006.04.27
申请号 US20040973182 申请日期 2004.10.25
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD. 发明人 TAN SOON Y.;TAN SIA K.;LIN QUNYING;CHONG HUEY M.;HSIA LIANG-CHOO
分类号 G03F9/00;G03F7/00 主分类号 G03F9/00
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