| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a protective film forming composition which can be stripped with developer in liquid immersion exposure and is capable of suppressing adverse effect on a resist film and forming an excellent resist pattern, and to provide a pattern forming method using the protective film forming composition. <P>SOLUTION: The protective film forming composition for liquid immersion exposure comprises: a resin (a) which is insoluble to water and is soluble to alkali developer; and a ketone type solvent (b) of which a hydrogen bonding component of SP value δh [(cal/cm<SP>3</SP>)<SP>1/2</SP>] falls into the range of 0<δh<4.2. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
