发明名称 POLARIZED LIGHT IRRADIATION METHOD FOR PHOTO ORIENTATION AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To minimize a polarized light irradiation device for photo orientation upon imparting orientation control performance to an orientation layer of a liquid crystal device substrate by using polarized light. SOLUTION: The polarized light irradiation device 150 for photo-aligning comprises an optical system 20 and a stage system 160. The optical system 20 comprises a polarized light UV laser 1 which outputs linearly polarized light, a beam expander 2, a diffractive optical element 3, a light shielding plate 4, and an irradiation lens 5. The polarized UV laser 1 outputs linearly polarized light, and the laser light exiting the polarized UV laser 1 is expanded in its beam diameter by the beam expander 2. The lens used for the beam expander 2 has a long focal distance. The orientation layer substrate 11 is held on an XYZθstage 12 by vacuum sucking or the like. The orientation layer substrate 11 is irradiated with laser light partially by reducing an irradiation region, and the entire surface of the orientation layer substrate 11 is irradiated with the polarized light by step-and-repeat scanning the XYZθstage 12 in two directions of X and Y. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006113180(A) 申请公布日期 2006.04.27
申请号 JP20040298781 申请日期 2004.10.13
申请人 HITACHI DISPLAYS LTD 发明人 SAITOU KEIYA;NAKADA TOSHIHIKO;YOSHITAKE YASUHIRO
分类号 G02F1/1337;G02F1/13 主分类号 G02F1/1337
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