| 摘要 |
PROBLEM TO BE SOLVED: To uniformize the sensitivity of an image sensor in a detection visual field, even under an optical condition wherein the reflected light or diffracted light from an inspection object changes corresponding to the pattern density of the inspection object. SOLUTION: In the inspection device capable of arbitrarily selecting a plurality of optical conditions, capable of altering the distribution of the reflected light or diffracted light from the inspection object, having a unidimensional or two-dimensional photoelectric conversion image sensor, scanning the stage loaded with the inspection object or scanning the image sensor, to acquire an optical image and inspecting the flaws or the like of the inspection object by image processing or the like; image sensor output correction data is formed from the intensity-of-light distribution and contrast in the detection visual field of the image sensor acquired by imaging an inspection target sample for cach optical condition (illumination optical system, detection optical system, scanning direction or the like) and correction of the image sensor output is carried out. COPYRIGHT: (C)2006,JPO&NCIPI
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