发明名称 |
COATING LIQUID FOR FORMING LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM, METHOD FOR PREPARING SAME, AND LOW DIELECTRIC CONSTANT AMORPHOUS SILICA COATING FILM OBTAINED FROM SAME |
摘要 |
<p>Disclosed is a coating liquid for forming an amorphous silica coating film which has a dielectric constant as low as 3.0 or less and low leakage current. Also disclosed is a method for preparing such a coating liquid. Specifically disclosed is a coating liquid for forming a low dielectric constant amorphous silica coating film which is characterized by being a liquid composition containing (a) a silicon compound obtained by hydrolyzing a tetraalkyl orthosilicate (TAOS) and an alkoxysilane (AS) in the presence of a tetraalkyl ammonium hydroxide (TAAOH) and water, or a silicon compound obtained by hydrolyzing or partially hydrolyzing a tetraalkyl orthosilicate (TAOS) in the presence of a tetraalkyl ammonium hydroxide (TAAOH) and water, then mixing the resulting with an alkoxysilane (AS) or a hydrolysis product or partial hydrolysis product thereof, and then, if necessary, further hydrolyzing a part or the entire of the resulting mixture; (b) an organic solvent; and (c) water. The coating liquid is further characterized in that the amount of water contained in the liquid composition is within the range of 30-60% by weight.</p> |
申请公布号 |
WO2006043438(A1) |
申请公布日期 |
2006.04.27 |
申请号 |
WO2005JP18667 |
申请日期 |
2005.10.11 |
申请人 |
CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.;ARAO, HIROKI;EGAMI, MIKI;NAKASHIMA, AKIRA;KOMATSU, MICHIO |
发明人 |
ARAO, HIROKI;EGAMI, MIKI;NAKASHIMA, AKIRA;KOMATSU, MICHIO |
分类号 |
C09D183/04;B05D7/24;C01B33/12;C09D5/25;C09D7/14;C09D183/02;H01L21/312;H01L21/316;H01L21/768 |
主分类号 |
C09D183/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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