发明名称 |
BARRIER RIB STRUCTURE, FORMATION METHOD THEREOF, DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC EQUIPMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a bank structure for forming a fine pattern in a thin line shape precisely and stably; and to provide a pattern formation method, an electro-optical device, and electronic equipment. <P>SOLUTION: A barrier rib structure with a recess corresponding to a pattern formed by a functional liquid provided therein comprises a first recess 56 provided corresponding to a first pattern 40, and a second recess 57 that is wider than the first recess 56 and corresponds to a second pattern provided in a shape having an arc at least at one portion of the outer periphery at one portion of the first recess 56. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006114585(A) |
申请公布日期 |
2006.04.27 |
申请号 |
JP20040298450 |
申请日期 |
2004.10.13 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HIRAI TOSHIMITSU;SAKAI MARI |
分类号 |
H01L21/3205;G02F1/1343;G02F1/1368;G09F9/00;G09F9/30;H01L21/28;H01L21/288;H01L21/336;H01L29/786;H01L51/50;H05B33/22 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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