NEW POLYMERIZABLE MONOMER, PHOTOSENSITIVE COMPOSITION CONTAINING THE SAME AND LITHOGRAPHIC PRINTING PLATE

摘要

PROBLEM TO BE SOLVED: To find out a new photopolymerizable monomer having a high photopolymerization property and high sensitivity, and also a photosensitive composition having a sufficient film strength and eluting property on its development.

SOLUTION: This polymerizable monomer is characterized by having ≥2 unit structures expressed by formula (1) in its molecule, and the photosensitive composition containing the same is also provided.

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