发明名称 VACUUM VAPOR-DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To enhance uniformity of film thickness distribution on a plurality of substrate faces in a vacuum vapor-deposition method in which an organic electroluminescent element is fabricated by using a mask for vapor-depositing the substrate and pixel pattern, and using a mask holder and a vapor deposition source provided with alignment mechanism in order to carry out positioning of the substrates and the masks. SOLUTION: In this vacuum vapor-deposition method, a plurality number of structures composed of the substrates, the masks, and the mask holders are concentrically arranged at the upper part of the vapor deposition source, and the vapor deposition is carried out in a state that the structures consisting of the substrates, the masks, and the mask holders are inclined toward the outside from the center part of the vapor-deposition source. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006114427(A) 申请公布日期 2006.04.27
申请号 JP20040302734 申请日期 2004.10.18
申请人 CANON INC 发明人 FUKUDA NAOTO;YOSHIKAWA TOSHIAKI;KANAI MASAHIRO
分类号 H05B33/10;C23C14/24;H01L51/50 主分类号 H05B33/10
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