发明名称 |
Method of making a getter structure |
摘要 |
A method of manufacturing a getter structure, including forming a support structure having a support perimeter, where the support structure is disposed over a substrate. In addition, the method includes forming a non-evaporable getter layer having an exposed surface area, where the non-evaporable getter layer is disposed over the support structure, and includes forming a vacuum gap between the substrate and the non-evaporable getter layer. The non-evaporable getter layer extends beyond the support perimeter of the support structure increasing the exposed surface area.
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申请公布号 |
US2006087232(A1) |
申请公布日期 |
2006.04.27 |
申请号 |
US20050255459 |
申请日期 |
2005.10.20 |
申请人 |
RAMAMOORTHI SRIRAM;CHEN ZHIZHANG;LIEBESKIND JOHN;ENCK RONALD L;SHIH JENNIFER |
发明人 |
RAMAMOORTHI SRIRAM;CHEN ZHIZHANG;LIEBESKIND JOHN;ENCK RONALD L.;SHIH JENNIFER |
分类号 |
H01J9/38;H01J7/18;H01J17/24;H01J61/26 |
主分类号 |
H01J9/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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