发明名称 Exposure device
摘要 In order to provide an exposure device by which aligning of an exposure pattern is realized when manufacturing a build up wiring board or the like, an exposure device which exposes a photosensitive material with a light beam modulated in accordance with image information comprising a reading section which reads a radioscopic image of a specific pattern provided on an inner layer of a laminated structure, and an aligning section which aligns an exposure position of the photosensitive material laminated on a surface of an outer layer of the laminated structure on the basis of the position information of the read radioscopic image of the specific pattern, is provided.
申请公布号 US7050716(B2) 申请公布日期 2006.05.23
申请号 US20040009028 申请日期 2004.12.13
申请人 FUJI PHOTO FILM CO., LTD. 发明人 NAKAYA DAISUKE;FUJII TAKESHI;KUDOH YOSHIMITSU
分类号 G03B41/00;G03F7/20;G03F9/00;H05K1/02;H05K3/00;H05K3/46 主分类号 G03B41/00
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