发明名称 |
Exposure device |
摘要 |
In order to provide an exposure device by which aligning of an exposure pattern is realized when manufacturing a build up wiring board or the like, an exposure device which exposes a photosensitive material with a light beam modulated in accordance with image information comprising a reading section which reads a radioscopic image of a specific pattern provided on an inner layer of a laminated structure, and an aligning section which aligns an exposure position of the photosensitive material laminated on a surface of an outer layer of the laminated structure on the basis of the position information of the read radioscopic image of the specific pattern, is provided.
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申请公布号 |
US7050716(B2) |
申请公布日期 |
2006.05.23 |
申请号 |
US20040009028 |
申请日期 |
2004.12.13 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
NAKAYA DAISUKE;FUJII TAKESHI;KUDOH YOSHIMITSU |
分类号 |
G03B41/00;G03F7/20;G03F9/00;H05K1/02;H05K3/00;H05K3/46 |
主分类号 |
G03B41/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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