发明名称 Methods for forming wiring and electrode
摘要 There is provided a method for forming wiring or an electrode by coating a substrate with a composition comprising (A) a complex of an amine compound and a hydrogenated aluminum compound and (B) a titanium compound or a composition comprising the complex and (C) metal particles and subjecting the obtained coating film to heating and/or a light treatment. By the method, a film can be formed that uses a conductive film forming composition with which wiring and an electrode that can be suitably used for electronic devices can be formed easily and inexpensively.
申请公布号 US7071084(B2) 申请公布日期 2006.07.04
申请号 US20040808441 申请日期 2004.03.25
申请人 INTERNATIONAL CENTER FOR MATERIALS RESEARCH 发明人 YOKOYAMA YASUAKI;YONEKURA ISAMU;SATOH TAKASHI;WAKASAKI TAMAKI;TAKEUCHI YASUMASA;ENDO MASAYUKI
分类号 H01L21/30;C23C18/02;C23C18/14;H01L21/288;H01L21/46 主分类号 H01L21/30
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