发明名称 Acid dip for zinc-manganese alloy electrodeposition
摘要 The invention relates to a dip comprising an acid aqueous solution having no ammonium ion, fluoroborate ions or citrate ion and containing per liter: between 10 and 60 g of Zn<SUP>2+</SUP> ions and between 20 and 100 g of Mn<SUP>2+</SUP> ions. The invention is characterised in that it comprises a buffer agent that maintains the pH at a value of between 3 and 7, preferably between 4.5 and 6 or better still between 4.8 and 5.5, and another agent, different from the buffer agent, which is used to bring together the deposition potentials of couple Zn/Zn<SUP>2+</SUP> and couple Mn/Mn<SUP>2+</SUP>. The inventive dip used to deposit a Zn and Mn alloy by electrolysis.
申请公布号 US7070689(B2) 申请公布日期 2006.07.04
申请号 US20030467264 申请日期 2003.08.04
申请人 COVENTYA 发明人 THIERY LIONEL;SCHIAVON GIANLUIGI;POMMIER NICOLAS
分类号 C25D3/56;C23C18/00 主分类号 C25D3/56
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