| 摘要 |
PROBLEM TO BE SOLVED: To control the surface temperature of a substrate for film formation so as to keep a predetermined and uniform temperature distribution in a film formation device, such as an MOCVD device for forming a substrate by temperature control of the susceptor for every zone. SOLUTION: In advance, the corresponding relations have been obtained between the detection data of an infrared temperature detection sensor 26 on a heating body 22b in the rear side and the detection data of an infrared temperature detection sensor 28b on the susceptor front side. In the film formation process, based on the detection data of the infrared temperature detection sensor 26 in the rear side of the heating body, the presumed calculation of the detection data of the surface temperature on the susceptor front side is carried out by using the corresponding relations obtained beforehand. On the basis of these detection data by which presumed calculation is carried out and the detection data of the infrared temperature detection sensor 28b on the susceptor front side in a film formation process, the corrected amount is defined to the detection data of the infrared temperature detection sensor 28b on the susceptor front side. The detection data detected by the infrared temperature detection sensor 28a of the substrate 14 is corrected by using the corrected amount, so that the surface temperature of the substrate 14 in the film formation process may be calculated. Thus, a heating source 23a is controlled on the basis of the calculated temperature. COPYRIGHT: (C)2006,JPO&NCIPI
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