发明名称 Method for constructing contact formations
摘要 According to one aspect of the invention, a method for forming contact formations is provided. A substrate may be placed in an electrolytic solution. The substrate may have an exposed conductive portion and the electrolytic solution may include a plurality of metallic ions and an accelerator. The accelerator may include at least one of bis-(sodium sulfopropyl)-disulfide and 3-mercapto-1-propanesulfonic acid-sodium salt. A voltage may be applied across the electrolytic solution and the conductive portion of the substrate to cause the metallic ions to be changed into metallic particles and deposited on the conductive portion. The electrolytic solution may also include a protonated organic additive. The electrolytic solution may also include an acid and a surfactant. The acid may include at least one of sulfuric acid, methane sulfonic acid, benzene sulfonic acid, and picryl sulfonic acid. The surfactant may include at least one of polyethylene glycol and polypropylene glycol.
申请公布号 US7442634(B2) 申请公布日期 2008.10.28
申请号 US20040019857 申请日期 2004.12.21
申请人 INTEL CORPORATION 发明人 DUBIN VALERY M.;HUANG TZUEN-LUH;FANG MING;LEE KEVIN J.;LIANG YUEHAI;CHANG MARGHERITA
分类号 H01L21/44 主分类号 H01L21/44
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