发明名称 Solid-state imaging device and production method therefor
摘要 By improving the embedding property of a light-transmissive material constituting a waveguide, light collection efficiency is improved, and reliability of a solid-state imaging device is ensured. In a solid-state imaging device including a light-receiving section ( 1 ) which performs photoelectric conversion in response to receipt of light and a waveguide ( 20 ) composed of a light-transmissive material formed in an insulating film 5 which covers a substrate provided with the light-receiving section ( 1 ), in which the waveguide ( 20 ) guides incident light from outside to the light-receiving section ( 1 ), the waveguide ( 20 ) is provided with a forward tapered portion in which the size of the planar shape viewed from the direction of incident light decreases from the light incident side surface toward the light-receiving section.
申请公布号 US7442973(B2) 申请公布日期 2008.10.28
申请号 US20050538943 申请日期 2005.06.13
申请人 SONY CORPORATION 发明人 KOMOGUCHI TETSUYA;ENOMOTO YOSHIYUKI
分类号 H01L31/062;H01L27/146;H04N5/225 主分类号 H01L31/062
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