发明名称 Methods, systems, and polymer substances relating to consideration of H2O levels present within an atmospheric-pressure nitrogen dielectric-barrier discharge
摘要 Methods and systems utilize an atmospheric-pressure nitrogen dielectric-barrier discharge to treat the surface of polymer substances. The atmospheric-pressure nitrogen dielectric-discharge may be maintained with a level of H<SUB>2</SUB>O below a pre-defined amount, such as by measuring and controlling the H<SUB>2</SUB>O within a treater, to produce a surface treatment for a polymer substance that yields desirable characteristics. Furthermore, the H<SUB>2</SUB>O level may be measured and controlled according to a pre-defined amount or according to another parameter such as an analysis of the resulting polymer surface. For example, the polymer surface may be provided with an optimal added nitrogen-to-added oxygen ratio and/or an optimal stability based on washed and unwashed advancing contact angles such as by controlling the H<SUB>2</SUB>O level within the treater based on these analyses of the treated polymer.
申请公布号 US7442442(B2) 申请公布日期 2008.10.28
申请号 US20040883263 申请日期 2004.07.01
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 STROBEL MARK A.;KIRK SETH M.;GETSCHEL JOEL A.;SKARUPPA MATTHEW J.
分类号 B05D3/00;C08J7/12 主分类号 B05D3/00
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