| 发明名称 |
Method of treating surface of substrate used in biological reaction system |
| 摘要 |
Provided is a method of treating a surface of a substrate used in a biochemical reaction system, the method including forming a polymer film on the surface by vapor deposition of a compound of formula (1) below and a compound of formula (2) below: <?in-line-formulae description="In-line Formulae" end="lead"?>(RO)<SUB>3</SUB>-Si-(CH<SUB>2</SUB>)<SUB>n1</SUB>-X (1)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>(RO)<SUB>3</SUB>-Si-(CH<SUB>2</SUB>)<SUB>n2</SUB>-(CF<SUB>2</SUB>)<SUB>m</SUB>-X (2)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein R is one of a methyl group and an ethyl group, X is one of a methyl group and a trifluoromethyl group, n1 is an integer from 1 to 3, n2 is an integer from 1 to 10, and m is an integer from 1 to 10.
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| 申请公布号 |
US7442503(B2) |
申请公布日期 |
2008.10.28 |
| 申请号 |
US20040765366 |
申请日期 |
2004.01.27 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM SUN-HEE;LEE SOO-SUK;LIM GEUN-BAE;LEE YOUNG-SUN |
| 分类号 |
C12N15/09;C12Q1/68;B01L3/00;B01L7/00;B05D7/24;C03C17/30;C12M1/00;C12P19/34 |
主分类号 |
C12N15/09 |
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