发明名称 Illumination system particularly for microlithography
摘要 There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.
申请公布号 US7443948(B2) 申请公布日期 2008.10.28
申请号 US20060345880 申请日期 2006.02.02
申请人 CARL ZEISS SMT AG 发明人 SCHULTZ JOERG;WANGLER JOHANNES;SCHUSTER KARL-HEINZ;DINGER UDO;SINGER WOLFGANG;ANTONI MARTIN;WIETZORREK JOACHIM;HAINZ JOACHIM
分类号 G21K5/04;G02B17/06;G03F7/20;G21K1/06;G21K5/00 主分类号 G21K5/04
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