发明名称 Method for fabricating forward and reverse blocking devices
摘要 A power device includes a gate electrode, a source electrode, and a drain electrode provided within an active region of a semiconductor substrate of first conductivity type. A vertical diffusion region of second conductivity is provided at a periphery the active region. The vertical diffusion region extends continuously from a top surface of the substrate to a bottom surface of the substrate. The vertical diffusion region includes an upper portion having a first depth and a lower portion having a second depth that is substantially greater than the first depth.
申请公布号 US7442630(B2) 申请公布日期 2008.10.28
申请号 US20050217134 申请日期 2005.08.30
申请人 IXYS CORPORATION 发明人 KELBERLAU ULRICH;INGRAM PETER;ZOMMER NATHAN
分类号 H01L21/04;H01L21/265;H01L21/331;H01L29/06;H01L29/739 主分类号 H01L21/04
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