摘要 |
<p>A display device and a manufacturing method thereof are provided to improve an aperture ratio, thereby displaying a high-definition image. A display device includes a first substrate, a gate line(110), a first inter-layer insulating film, a first data line(141), a second data line(142), a common electrode(161), a second inter-layer insulating film, a pixel electrode(162), and a second substrate. A pixel region is defined on the first substrate. The gate line is formed in the upper part of the first substrate. The first inter-layer insulating film covers the gate line. The first data line is formed in the upper part of the first inter-layer insulating film and crosses the pixel area. The second data line is formed in the upper part of the first inter-layer insulating film and defines the pixel area with the gate line. A voltage is applied to the common electrode through the first data line. The second inter-layer film covers the first and second data lines. The pixel electrode is formed in the upper part of the second inter-layer insulating film. A voltage is applied to the pixel electrode through the second data line. The second substrate faces the first substrate.</p> |