发明名称 Liquid crystal display device having polycrystalline silicon thin film transistor and method of fabricating the same
摘要 A method of fabricating an array substrate for a liquid crystal display device includes forming an alignment key on a substrate having a display region and a non-display region surrounding the display region; forming an amorphous silicon layer on the alignment key; crystallizing a predetermined portion of the amorphous silicon layer using the alignment key as a reference; patterning the amorphous silicon layer using the alignment key as a reference to form a polycrystalline silicon layer, the polycrystalline silicon layer being formed from the predetermined portion of the amorphous silicon layer; forming a gate insulating layer on the semiconductor layer; forming a gate electrode on the gate insulating layer using the alignment key as a reference; forming an interlayer insulating layer on the gate electrode; and forming source and drain electrodes on the interlayer insulating layer.
申请公布号 US7443457(B2) 申请公布日期 2008.10.28
申请号 US20040865790 申请日期 2004.06.14
申请人 LG DISPLAY CO., LTD. 发明人 SEO HYUN-SIK;KIM YOUNG-JOO;KIM SANG-HYUN
分类号 G02F1/136;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/786 主分类号 G02F1/136
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