发明名称 |
Method for forming mask pattern of semiconductor device |
摘要 |
A method for forming a mask pattern of a semiconductor device is disclosed. An example method arranges a main pattern and arranges a first fine auxiliary pattern in the vicinity of the main pattern. The example method also arranges a second fine auxiliary pattern in the vicinity of edges of the main pattern. In the example method, the second fine auxiliary pattern has a predetermined tilt angle with respect to the first fine auxiliary pattern.
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申请公布号 |
US7442473(B2) |
申请公布日期 |
2008.10.28 |
申请号 |
US20040023307 |
申请日期 |
2004.12.27 |
申请人 |
DONGBU ELECTRONICS CO., LTD. |
发明人 |
LEE JUN SEOK |
分类号 |
G03F1/00;H01L21/027;G03C5/00;G03F1/14;G03F9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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