发明名称 Charged particle beam apparatus
摘要 When a sample includes repeated cells, a scale pattern corresponding to the repeated cells is generated. Next, the scale pattern generated is superimposed on the image of the repeated cells of the sample, thereby identifying a destination cell. Moreover, disposition of the repeated cells of the sample is determined based on positions of at least three ends of the repeated cells. Then, the position of the destination cell is identified from this disposition of the repeated cells. Furthermore, a zoom image is generated by a combination of a zoom based on beam deflection function and a zoom based on software. Then, the image shift is performed by software without displacing a sample stage.
申请公布号 US7442928(B2) 申请公布日期 2008.10.28
申请号 US20060527522 申请日期 2006.09.27
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 OHNISHI TSUYOSHI
分类号 H01J37/304 主分类号 H01J37/304
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