发明名称 Common rack for electroplating and PVD coating operations
摘要 Disclosed is a multi-step process for the coating of a substrate without re-racking the substrate between the coating operations comprising: providing a substrate holder with an inert protective polymeric coating covering a substantial portion of the holder; affixing a substrate to the substrate holder; electroplating a coating onto the substrate; without re-racking the substrate, applying a physical vapor deposition coating to the coated substrate; and removing the twice coated substrate from the substrate holder.
申请公布号 US7442285(B2) 申请公布日期 2008.10.28
申请号 US20040869965 申请日期 2004.06.17
申请人 VAPOR TECHNOLOGIES, INC. 发明人 BRONDUM KLAUS
分类号 C23C28/02;C23C14/50;C23C16/458;C25D5/48;C25D7/00;C25D17/08 主分类号 C23C28/02
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