| 摘要 |
A semiconductor device manufacturing apparatus is provided to prevent a processing error of a process chamber by preventing an inflow of an excessive amount of gas into the process chamber. An opening/closing valve is installed at a gas transport tube and controls an opening/closing rate according to a valve voltage. A flow rate controller is installed at the gas transport tube and controls a flow rate of the opening/closing valve. The flow rate controller includes a sensor part(410) for sensing the gas transported by the gas transport tube, a flow rate calculation part(420) for generating a flow rate calculation value, a valve voltage selector(430) from a sensed value, a comparator(440) for comparing a final selected valve voltage with a control valve voltage corresponding to a target flow rate, and an interlock part(450) for interrupting the valve voltage by using the opening/closing valve.
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