| 摘要 |
<p>A method for forming a photosensitive resin film is provided to reduce a variation in thickness of a photosensitive resin film before forming a patterned image, such as barrier ribs for pixels, and to realize improved water repellency and ink repellency of a photosensitive resin film. A method for forming a photosensitive resin film comprises the steps of: providing a photosensitive resin composition by adding an ink-repellent, wherein the ink-repellent causes a difference in surface energies of at least 2 mN/m before and after adding the same; and applying the photosensitive resin composition onto a substrate or provisional substrate, followed by vacuum drying, to form a photosensitive resin film.</p> |
