APPARATUS FOR SUPPLYING GAS

摘要

A gas supplying apparatus is provided to uniformly supply source gas to process chambers by preventing a flux change or flow characteristic change of carrier gas. A container(210) accommodates a liquefied source. A cover(220) seals an upper portion of the container. Plural first gas supplying pipes(230) are extended downward through the cover. Each low end of the first gas supplying pipes is immersed in the liquefied source accommodated in the container. The first gas supplying pipes supply the carrier gas so that bubbles of the carrier gas are generated in the liquefied source in order to evaporate the liquefied source. At least one space partition member(240) divide an inner space in the container into plural spaces so that source gases formed by the bubbles of the carrier gas supplied from each first gas supplying pipes are not mixed with each other. Second gas supplying pipes(250) are communicated with the divided spaces. The second gas supplying pipes supply the source gases to the outside.