| 摘要 |
<p>An exposure apparatus and semiconductor device using the same are provided to control direction of polarization used as exposure light source by using a phase retarder. An exposure apparatus comprises a phase retarder(130) and an exposure mask(140). The phase retarder is provided in a polarization light system(110) and changes polarization direction which is preliminarily established. The exposure mask is located beneath the phase retarder and has a predetermined pattern. The phase retarder changes polarization direction according to the pattern direction of the exposure mask.</p> |
