VACUUM APPARATUS OF SEMICONDUCTOR DEVICE MANUFACTURING EQUIPMENT

摘要

A vacuum apparatus of semiconductor device manufacturing equipment is provided to reduce a maintenance cost by preventing deposition of particles in an exhaust line. A pump unit pumps air of an inside of a process chamber(100) for performing unit processes. An exhaust line unit connects the process chamber with the pump unit to form a flow path of the pumped air. The exhaust line unit includes a slope which is formed at an intersection between a vertical line and a horizontal line. The intersection has a concavo-convex structure. The inside of the concavo-convex structure of the intersection is coated with ceramics. The pump unit includes a turbo pump connected to the process chamber and a dry pump for assisting the turbo pump.