| 摘要 |
An anti-reflection film composition is provided to improve etching-resistance of an anti-reflection film and adhesive property between films by comprising polyhedralsilsesquioxane containing large amount of silicone. An anti-reflection film composition comprises an acid generator, a crosslinking agent and polyhedralsilsesquioxane represented by a formula(1) and is prepare by dissolving the acid generator, the crosslinking agent and the polyhedralsilsesquioxane in an organic solvent such as methyl diethyleneglycolethylether, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, propylene glycol methyl ether acetate, cyclohexanone, 2-heptanone, ethyl lactate and a mixture thereof. In the formula(1), R1 is a benzene ring, a naphthalene ring or an anthracene ring or a ring including at least one substitutent.
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