Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method

摘要

When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a', which orthogonally projects point a on the plate, and a second line segment linking point B and point b', which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.