ETCHANT FOR ZINC OXIDE BASED THIN-FILM, AND METHOD FOR PATTERNING ZINC OXIDE BASED THIN-FILM

摘要

PROBLEM TO BE SOLVED: To provide an etchant for a zinc oxide based thin-film capable of improving patterning characteristics by adjusting the etching rate of the zinc oxide based thin-film, and to provide a method for patterning the zinc oxide based thin-film. SOLUTION: The etchant for the zinc oxide based thin-film etches and patterns the zinc oxide based thin-film mainly comprising zinc oxide. The etchant for the zinc oxide based thin-film uses at least one kind of an organic acid selected from a group consisting of propionic acid, succinic acid and citric acid as an effective component. COPYRIGHT: (C)2008,JPO&INPIT