| 摘要 |
PROBLEM TO BE SOLVED: To suppress unevenness produced on a pattern, when forming the pattern of a phosphor by applying phosphor paste in grooves between a plurality of ribs. SOLUTION: A pattern forming device includes a nozzle part 5 having a plurality of discharge openings 52, and a mechanism to move a substrate 9 to the nozzle part 5. While phosphor paste 8 is continuously discharged from the discharge port 52, the nozzle part 5 moves relatively to a scanning direction, and the phosphor paste 8 is applied between ribs 92 arranged on the substrate 9 thereby. This pattern forming device 1 also includes a mechanism to minutely move the nozzle part 5 in a direction perpendicular to the scanning direction, and the nozzle part 5 is irregularly and minutely moved in the direction perpendicular to the scanning direction while the nozzle part 5 is scanning. Thereby, the phosphor paste 8 is prevented from continuing to partially adhere to one side of the ribs 91 on both sides, and unevenness of the phosphor paste on the pattern is suppressed. COPYRIGHT: (C)2008,JPO&INPIT
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