发明名称 System and method for forming a conductive pattern
摘要 A system and method for forming a conductive pattern. In the illustrative embodiment, the system includes an applicator for applying a conductive substance onto a surface of a structure and a mechanism for precisely moving the applicator such that the conductive substance is applied in a desired pattern. In an illustrative embodiment, the mechanism includes a robotic arm driven by commands from a computer, and the conductive pattern is designed to manipulate the electromagnetic properties of the structure. The system can be used to apply a conductive pattern directly onto an electromagnetic component, such as a radome, IR dome, multi-mode dome, or flat plate EM window, or to apply a conductive pattern onto a component mold during the component fabrication process. In the latter case, the conductive pattern is an integrated part of the component.
申请公布号 US2008165075(A1) 申请公布日期 2008.07.10
申请号 US20070650243 申请日期 2007.01.05
申请人 RAYTHEON COMPANY 发明人 ADAIR EMERALD J.;FOWLER GRAY E.
分类号 H01Q1/42;H01F7/128 主分类号 H01Q1/42
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