发明名称 METHOD (VARIANTS) AND SYSTEM (VARIANTS) FOR TREATMENT OF SEMI-CONDUCTOR INSTRUMENTS BASE PLATES
摘要 FIELD: methods for manufacture of semi-conductor instruments and microcircuit chips. ^ SUBSTANCE: method and system are suggested for treatment of base plates for treatment of semi-conductor instruments with creation of liquid meniscus that is shifted from the first surface to the parallel second one, which is installed nearby. System and method suggested in invention may also be used for meniscus shift along base plate edge. ^ EFFECT: invention provides efficient cleaning and drying of surfaces and edges of semi-conductor plates, with simultaneous reduction of quantity of water or washing liquid drops that are accumulated on plate surface, which leave dirty traces on plate surface and edge after evaporation. ^ 20 cl, 20 dwg
申请公布号 RU2328794(C2) 申请公布日期 2008.07.10
申请号 RU20040115754 申请日期 2003.09.29
申请人 LAM RISERCH KORPOREJSHN 发明人 VUDS KARL A.;GARSIA DZHEJMS P.;DE-LARIOS DZHON M.;RAVKIN MAJKL;REDEKER FRED S.
分类号 H01L21/306;H01L25/00;B08B1/02;B08B3/04;H01L21/00 主分类号 H01L21/306
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