| 摘要 |
PROBLEM TO BE SOLVED: To provide electrode patterns for evaluation to precisely evaluate volume resistivity and an effective thickness of a semiconductor layer at a surface side, in a semiconductor substrate in which the same conductive type semiconductor layers are formed into two layers, and also to provide an evaluating method of the semiconductor layers using it. SOLUTION: In the semiconductor substrate, the first conductive type first semiconductor layer 1a is formed on a surface portion, and the second semiconductor layer 1b which is higher in impurity concentration than the first conductive type first semiconductor layer 1a is formed under the first semiconductor layer 1a. A pair of the electrode patterns P1 to evaluate the volume resistivity of the first semiconductor layer 1a are provided, wherein an interval L1 of a pair of the electrode patterns P1 is set narrower than a design thickness D of the first semiconductor layer 1a. COPYRIGHT: (C)2008,JPO&INPIT
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