发明名称 NOZZLE, SUBSTRATE TREATMENT APPARATUS, AND SUBSTRATE TREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To increase a particle density of a liquid on a substrate, to make the arrival velocity of a particle at the substrate adjustable, and to prevent particles from sticking to the inner surface of a nozzle. SOLUTION: An auxiliary nozzle 42 in a cylindrical shape is mounted on the top of a liquid drop generating nozzle 41 for jetting liquid drops. In the auxiliary nozzle 42, an accelerated gas is introduced via an accelerated gas inlet 426a, and by having an injection area for liquid drops restricted at a lower end 423, the density of the liquid drops is increased and makes the arrival velocity of the liquid drop at the substrate adjustable. By having the accelerated gas introduced into the inside of an internal circumference surface 424, along a direction which is inclined from a direction perpendicular to an center axis J1, toward the lower end 423 and comes off from the center axis J1, the accelerated gas turns along the internal circumference surface 424 and prevents the liquid drops from sticking to the internal circumference surface 424. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008159989(A) 申请公布日期 2008.07.10
申请号 JP20060349322 申请日期 2006.12.26
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SATO MASANOBU
分类号 H01L21/304;B05B1/34;B05B7/06;B05C11/08;B08B3/02 主分类号 H01L21/304
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