| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus which forms a film stably by decomposing film-forming gas having high decomposition temperature, and also to provide a film-forming method which forms a film stably by decomposing the film-forming gas having high decomposition temperature. SOLUTION: The film-forming apparatus has: a treatment vessel, where film-forming gas is supplied to the inside of a pressure-reduced space; a substrate holding section that is installed in the pressure-reduced space and holds the substrate to be treated; and a heater that is installed in the pressure-reduced space and heats the substrate to be treated to form a film by the film-forming gas on the substrate to be treated. The heater is made of a compound containing having high melting point metal and carbon. COPYRIGHT: (C)2008,JPO&INPIT
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