| 摘要 |
This method to make an original photoconductor or replacement element uses a two-slot coating process to substantially simultaneously deposit a new SMTL coating layer and a thinner overcoating on an already existing SMTL layer or on a substrate. The total thickness of the existing SMTL layer plus the new SMTL layer plus the overcoating thickness should not exceed the thickness of a belt area of a marking machine or corresponding components in the to be replaced photoconductor element or the tolerances set for said SMTL and overcoating layer when making a new belt.
|
