| 摘要 |
PROBLEM TO BE SOLVED: To prevent the collapse of a barrier rib pattern material layer in a resist mask removing process by way of forming between a substrate and a barrier rib material layer a bonding layer which can be burnt off when the barrier rib pattern material layer is calcined. SOLUTION: A barrier rib layer is formed on a substrate on which a resist film is formed and a patterning of the resist film is carried out, and after a barrier rib pattern material layer is formed by way of removing an unnecessary barrier rib material layer by using the patterned resist film, the resist film is removed from the barrier rib pattern material layer and then when barrier ribs are formed by calcining the barrier rib patter material layer, a bonding layer is formed between the substrate and the barrier rib material layer, and the bonding layer is made of a material which has a bonding strength enough to maintain the barrier rib pattern material layer on the substrate when the resist film is removed from the barrier rib pattern material layer and which can be burnt off when the barrier rib pattern material layer is calcined. COPYRIGHT: (C)2008,JPO&INPIT
|
