发明名称 PARTICLE-BEAM APPARATUS WITH IMPROVED WIEN-TYPE FILTER
摘要 PROBLEM TO BE SOLVED: To improve a particle filter apparatus to specifically select the desired particle species (the "nominal species") with reduced overall complexity and improved life time of each beam absorbing element. SOLUTION: A pattern is projected onto a target through a projection system by a beam of highly energetic charged particles of largely a species of a nominal mass having a nominal kinetic energy. To generate the beam, a particle source 11, a velocity-dependent deflector 32 and an illumination optical system are provided. The velocity-dependent deflecting means 32 comprises a transversal dipole electrical field and/or a transversal dipole magnetic field acting on the particles to cause the deviation of a particle path with respect to the path of the nominal species which is dependent on the velocity of the particles. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008159584(A) 申请公布日期 2008.07.10
申请号 JP20070320692 申请日期 2007.12.12
申请人 IMS NANOFABRICATION AG 发明人 PLATZGUMMER ELMAR
分类号 H01J37/05;H01J37/317 主分类号 H01J37/05
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