发明名称 |
Method for fabricating metal substrates with high-quality surfaces |
摘要 |
One embodiment of the present invention provides a method for fabricating a high-quality metal substrate. During operation, the method involves cleaning a polished single-crystal substrate. A metal structure of a predetermined thickness is then formed on a polished surface of the single-crystal substrate. The method further involves removing the single-crystal substrate from the metal structure without damaging the metal structure to obtain the high-quality metal substrate, wherein one surface of the metal substrate is a high-quality metal surface which preserves the smoothness and flatness of the polished surface of the single-crystal substrate.
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申请公布号 |
US2008166582(A1) |
申请公布日期 |
2008.07.10 |
申请号 |
US20070713423 |
申请日期 |
2007.03.02 |
申请人 |
XIONG CHUANBING;FANG WENQING;WANG LI;WANG GUPING;JIANG FENGYI |
发明人 |
XIONG CHUANBING;FANG WENQING;WANG LI;WANG GUPING;JIANG FENGYI |
分类号 |
H01L29/12;H01L21/02;H01L21/311 |
主分类号 |
H01L29/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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