SUBSTRATE TREATMENT DEVICE

摘要

A substrate treatment device includes: an external tank (10) for containing liquid, an ultrasonic wave generator (15) for applying an ultrasonic wave to the liquid contained in the external tank (10), an internal tank (20) arranged inside the external tank (10), and a pure water supply unit (30) for supplying liquid into the external tank (10). The internal tank (20) has a bottom symmetric against the center line of the internal tank (20) both in the width direction and the depth direction. Moreover, the pure water supply unit (30) supplies the liquid into the external tank (10) so that the flow of the liquid in the external tank (10) is symmetric against the center line of the internal tank (20) both in the width direction and the depth direction.