发明名称 Positive Photoresist Composition
摘要 Disclosed is a positive photoresist composition used for a liquid crystal display. The positive photoresist composition of the present invention includes 3 to 50% by weight of binder resin having a certain structure, 2 to 40% by weight of a photoactive compound and 10 to 94% by weight of an organic solvent. The positive photoresist composition according to the present invention may be useful to form a pattern for an organic insulator of a liquid crystal display, metal patterning, a bump, hole drilling and UV overcoat since it has good basic physical properties such as UV transmittance, film retention, pattern stability, chemical resistance and so on, as well as an excellent heat resistance.
申请公布号 US2008166656(A1) 申请公布日期 2008.07.10
申请号 US20050884185 申请日期 2005.12.21
申请人 SAM YANG EMS CO., LTD. 发明人 MOON BONG-SEOK;KIM HYO-JEONG;KIM JIN-GON;YOO YANG-HYUN;KIM MIN-JI;JEONG MI-KYEONG;YOO KWON-YIL;JUNG NAK-CHIL;KIM SEON-HO
分类号 G03F7/004 主分类号 G03F7/004
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