发明名称 Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition
摘要 A liquid-type composition for forming a photosensitive polymer complex and a method of preparing a photosensitive polymer complex containing silver nanoparticles using the same are provided. The composition for forming a photosensitive polymer complex includes a multifunctional epoxy resin, a photoacid generator, an organic solvent and a silver compound, or additionally includes a multifunctional acrylate resin and a photoinitiator, or an additive, e.g., a surfactant or a flow improver. This composition is applied, selectively exposed, and developed, thus preparing a photosensitive polymer complex, which contains silver nanoparticles uniformly dispersed and formed in the polymer pattern portion thereof through photo reduction and is therefore improved in terms of physical or chemical properties, e.g., heat resistance and wear resistance.
申请公布号 US2008166670(A1) 申请公布日期 2008.07.10
申请号 US20070806902 申请日期 2007.06.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK JONG JIN;PARK BYUNG HA;HA YOUNG UNG
分类号 G03C1/005;G03C5/04 主分类号 G03C1/005
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